20 years of GenICam

Simplified implementation of machine vision applications, regardless of the interface.

Barcelona, October 26th, 2026. The GenICam (Generic Interface for Cameras) machine vision standard is a key technology in industrial image processing. It is maintained by the European Machine Vision Association (EMVA) and was introduced in 2006 with the goal of enabling industrial cameras to be addressed and configured in a standardised manner, regardless of their interface or manufacturer. The widespread acceptance of GenICam within the industry demonstrates that this objective has been achieved.

The EMVA celebrated the 20th anniversary of the GenICam standard, as well as the GigE Vision interface – which was also introduced two decades ago – at this year’s VISION trade fair (Stuttgart, 6–8 October 2026) at the ‘International Machine Vision Standards’ stand.

Several experts involved in the development of GenICam highlighted the simplified inte-gration of cameras into machine vision systems as one of the key advantages of this standard. Thanks to this standard, the effort required for the development, integration and subsequent adaptation of vision systems has been significantly reduced. System integra-tors and users therefore benefit from more cost-effective overall solutions.

Michael Schmidt from Basler is currently Chair of the GenICam development group at EMVA. He emphasises: “The success of GenICam shows how the whole industry can benefit from common standards and good cooperation. Standardisation creates a win-win situation for both users and suppliers of components and software. We are proud of our contribution and hope that this spirit will continue for a long time to come.”

The development of GenICam remains dynamic, as the free and widely used library of the GenICam reference implementation is affected by the European Union’s Cyber Resilience Act (CRA). The relevant technical experts in the EMVA’s GenICam Working Group are al-ready working intensively on a practical solution that meets the needs of all stakeholders in the machine vision industry, ensuring that the GenICam reference implementation will remain available after December 11, 2027. From that date onwards, products must comply with the requirements of the CE marking, which has been extended to include CRA com-ponents, in order to continue to be marketed in Europe.

On the first day of the Vision trade fair, representatives from various organisations and standards bodies celebrated 20 years of GenIcam and GigE Vision with a small reception.

From left to right:

Michael Schmidt, Basler; Dr. Olaf Munkelt, MVTec; Thomas Lübkemeier, EMVA; Eric Car-ey, Teledyne; Jeff Burnstein, Association for Advancing Automation; George Chamberlain, Pleora Technologies; James Falconer, Pleora Technologies; and Dr Chris Yates, EMVA

Michael Schmidt:
„The whole industry benefits from common standards.“

 


About EMVA

Founded in 2003, the European Machine Vision Association (EMVA) is a not-for-profit and non-commercial association representing the Machine Vision industry in Europe that is open for all types of organizations having a stake in machine vision, computer vision, embedded vision or imaging technologies: manufacturers, system and machine builders, integrators, distributors, consultancies, research organizations and academia. The EMVA hosts four international vision standards, and all members – as the 100% owners of the association – benefit from the dedicated networking, standardization, and cooperation activities of the EMVA. www.emva.org

EMVA Members at VISION 2026

The time has come: The VISION show again opens its doors in Stuttgart, Germany, on October 6th, 2026.

As the VISION show certainly is one highlight in the trade show calendar, besides the EMVA presenting global vision standards in hall 8, booth 8E46, many of our EMVA members showcase technologies, products and services.
Visitors are invited to stop by:

Active Silicon H10 F59 N.A.T. H10 H46
ADVANTECH Europe H8 D12 Neousys Technology H8 C11
AIT Austrian Institute of Technology H8 C50 NovoViz H10 H35
Alkeria H8 C43 onsemi H10 D51
Allied Vision Technologies H10 F30 OPT Machine Vision H8 A61
Aqrose GmbH H8 B50 Opto Engineering H8 D48
BASLER AG H8 D50 Opto GmbH H10 C46
Baumer GmbH H8 D40 Optomotive H10 C16
Birger Engineering, Inc. H8 E48 Optotune Switzerland H10 G25
CBC Europe H10 H14 Optronis H10 C59
CCS Europe H10 E54 PhotonicSENS H10 C33
Components Express H10 D70 Pleora Technologies H8 B02
Delta Optical Thin Film A/S H10 C16 Prospectral H8 E60.17
DZOPTICS H10 F73 RAUSCHER GmbH H8 C48
Edmund Optics H8 C30 Restar Framos H10 C40
Effilux H10 E54 Schneider-Kreuznach H10 D56
Emergent Vision Technologies Inc. H8 C36 SICK H10 D41
evopro systems engineering AG H10 G48 Sightwise H8 C05
Excelitas Deutschland GmbH H10 E51 SinceVision Technology H8 A30
EXOSENS H8 C33 Singular Photonics H8 D47
Fraunhofer IOF H10 C92 Smart Vision Lights H10 D54
Fraunhofer IPA H10 D57 Sony Europe B.V. H10 C40
Fujifilm Germany H10 F50 SONY – Image Sensing Solution H10 C34
Headwall H10 D23 Spectricity H10 G63
Heliotis AG H10 C71 Stemmer Imaging H10 F16
Hirakawa Hewtech H10 G51 STMicroelectronics H10 C41
Hongkong Vico Technology H8 A54 Teledyne H8 B10
IDS Imaging Development Systems H8 C60 The Imaging Source Europe H10 E50
ifm electronic gmbh H10 D30 Theia Technologies H10 A47
iiM GmbH H10 C50 Toshiba Teli H8 C27
imavix engineering H8 E60.22 TPL Vision H8 C61
Imperx Inc. H10 F92 Ubicept H10 H82
intoPIX SA H10 A75 VA Imaging H8 D60
JAI A/S H10 C18 Valens Semiconductor H10 F80
Fraunhofer IOSB H8 E53 VDMA Machine Vision H8 E55 H8 E46
Kowa Optimed Deutschland H10 C66 Vieworks H10 E30
L.E.S.S. SA H10 B22 Vision Components H8 C31
Leimac Europe H10 A36 Vision Research H10 B82
LUCID Vision Labs H10 E40 VS Technology H10 F70
Macnica ATD Europe H8 D30 Hualing Opto-Electronics H10 F84
MBJ Imaging H8 B56 wenglor sensoric H8 C61
Medabsy GmbH H8 E60.2 XIMEA H10 D50
Midwest Optical Systems H10 F52 Z-LASER H10 C50
Mitsubishi Electric Europe H10 F34 Zebra Technologies H8 B40
Murrelektronik H10 D16 Zhejiang Huaray Technology H8 E20

International VISION Night – Registration Open

The EMVA is pleased to organize the popular International VISION Night event on the evening before the trade show starts. In good tradition – it will be the 15th Vision Night – the machine vision community will meet for a pleasant evening in a casual setting enjoying a dinner and networking opportunities. (7 pm. CET)

EMVA welcomes Eleven Dynamics

Eleven Dynamics combines industrial AI, automation, machine vision, and measurement technology into a single control layer for autonomous manufacturing. Our open platform EDAS connects robots, AI-powered cameras, sensors, and metrology systems to enable flexible Inline and Atline inspection with reliable results and tight cycle times

Delta Optical Thin Film becomes EMVA member

Delta Optical Thin Film A/S is a privately owned manufacturer of advanced optical thin film components. We focus entirely on designing and manufacturing custom parts for our global OEM customers. Being one of the pioneers in the optical thin film coating industry, we use our extensive knowledge to interact with our customers and find the right solution for their volume applications at the right price. Our unique products are Continuously Variable Filters. They are used to build compact, robust and affordable multispectral or hyperspectral cameras. Classical filters for machine vision cover the wavelength range from 300 nm to 1700 nm.

Vanessa Staderini receives EMVA Young Professional Award 2026

Awarded work focusses on Integrated Planning and Optimization for Robotic Visual Inspection

Barcelona/Stockholm, June 23rd, 2026. The EMVA Young Professional Award 2026 goes to Vanessa Staderini for her research work titled Integrated Planning and Optimization Framework for Robotic Visual Inspection. Vanessa Staderini received her Ph.D. in Electrical Engineering from TU Wien, where her research focused on bridging robotics and computer vision for automated visual inspection and inspection planning in industrial environments. Her doctoral work has been recognized with multiple Best Paper Awards at international conferences. She holds an M.Sc. in Robotics and Automation Engineering and a B.Sc. in Biomedical Engineering from the University of Pisa. She is currently a Scientist at the Austrian Institute of Technology in Vienna, where her work focuses on industrial inspection planning and robotic solutions for manufacturing applications.

Awarded work: Integrated Planning and Optimization for Robotic Visual Inspection
The work bridges the gap between advances in computer vision and robotics and the practical needs of industrial inspection. It integrates rigorous optimization and vision modeling into a planning framework designed for real robotic systems. Staderini proposes a model-based approach in which geometric coverage, spatial resolution, photometric feasibility, robotic kinematics, and motion are optimized jointly. Starting from CAD data, inspection poses are generated by sampling the object surface and refined via Bayesian optimization to ensure coverage and kinematic feasibility. Viewpoint selection and path planning are then formulated jointly as a Set Coverage Generalized Traveling Salesman Problem, which is solved using integer linear programming. This determines the minimal set of inspection viewpoints together with their optimal collision-free visiting order, providing a globally optimal and executable inspection plan without relying on heuristics. Beyond visibility, defect detection requires guaranteed spatial resolution. Staderini introduces sampling density matrix that extends binary visibility by enforcing minimum resolution constraints per surface element, enabling different regions of a component to be inspected at different resolution levels. In this way, inspection requirements such as defect detectability become explicit optimization objectives. To address reflective materials, photometric modeling is integrated into viewpoint evaluation.

Left to right:
Chris Yates (EMVA President), Vanessa Staderini, Marco Diani (EMVA Board Member)


About EMVA

Founded in 2003, the European Machine Vision Association (EMVA) is a not-for-profit and non-commercial association representing the Machine Vision industry in Europe that is open for all types of organizations having a stake in machine vision, computer vision, embedded vision or imaging technologies: manufacturers, system and machine builders, integrators, distributors, consultancies, research organizations and academia. The EMVA hosts four international vision standards, and all members – as the 100% owners of the association – benefit from the dedicated networking, standardization, and cooperation activities of the EMVA. www.emva.org

Wrap-Up IVSM Spring Meeting Prague

Main outcomes and decisions from the standard working groups

The machine vision standardization community is looking back on a successful spring edition of the International Vision Standards Meeting (IVSM) which was hosted by the European Machine Vision Association (EMVA) and held in the Czech capital, Prague from April 13 – 17. Overall, 82 machine vision engineers from all over the world have attended the meeting in person. The main discussions and decisions in the working groups are summarized as follows. Above that, a common theme in many meetings was the possible impacts of the EU Cyber Resilience Act and how to address the topic.

The GenICam meeting was attended by over 50 engineers. After more than three years of development, the working group released new versions of the Standard Features Naming Convention (SFNC) and the GenDC standard. SFNC 2.8 and GenDC 1.2 can now be downloaded from the EMVA website. Also discussed were major future extensions under development like the Generic Feature Access API (working title GenFeA), optimization potentials of the GenApi reference implementation, and future SFNC extensions including EMVA 1288 extensions for enhanced/automated data capturing during testing and support for hyperspectral cameras, upcoming updates to the GenApi reference implementation as well as the GenICam Device Validation, which aims to enhance interoperability in the Machine Vision marketplace between devices and software applications.

The CameraLinkHS working group plans to release the standard version 1.3 by the end of the year. It will contain some clarification of how to use MPO to LC fiber break-out-cable, add the defined way to transmit 32 bits per pixel and will include other minor improvements.

The USB3 Vision® technical meeting took place on Friday, April 17. Engineers from the standard working group discussed future possible extensions to the standard. The discussion on testing devices without High-Speed USB resulted in input for updating compliance documentation. An update was given on Infineon electronic parts. Overall, the meeting was productive and defined several follow-up actions for the technical community.

The GigEVision meeting included final changes on the GigEVision v. 3.0 which was set to be tested at the plugfest (see below). In connection to that, the voting for the release candidate of GigEVision 3.0 was prepared.

During the OOCI working group meeting a presentation was held by JIIA addressing their local standard LensConnect, which is about to be released by the end of 2026 being complimentary to OOCI. JIIA intends to use the OOCI-SFNC integration to enable easy software integration of the standard by end-users. In addition, farewell was given to the Chairs Marcel Naggatz and Erik Widding, connected with a call for new chairs.

The CoaXPress meeting addressed final changes on the CoaXPress 3.0 specification for the plugfest, and a release plan for the standard version to be agreed with the hosting association JIIA. Another topic was an update and roadmap about MicroChip 25Gbps components.

JIIA held a session at the IVSM to introduce two new standardization activities. One is the latest JIIA standard, LensConnect. The other is Small Optical Connectors.

Always being one of the highlights, the traditional plugfest gathered engineers applying the standards connecting a wide range of products to test compatibility, functionality and technical performance. Herein, the release candidate of GigEVision 3.0 had its inaugurating plugfest in preparing the release of the standard version.

During the commonly held Future Standards Forum (FSF) it was agreed that the G3 information brochure presenting machine vision standards will get a feature update regarding CoaXPress 2.x, CoaXPress-over-fiber and GigE Vision 3.0 to be ready in June and a major layout-change later in 2026.

Finally, the timeline for the two next International Vision Standard Meetings were announced:

  • Autumn 2026 IVSM hosted by A3 in Ottawa/Canada, October 2026
  • Spring 2027 IVSM hosted by JIIA in Fukuoka/Japan, April 2027.

The IVSM format is supported by the G3 group formed by A3 (US), CMVU (China), JIIA (Japan), EMVA (Europe) and VDMA (Germany).

GenICam Working Group Updates

During the International Vision Standard Meeting in Prague in April which was hosted by the EMVA, the GenICam working group has released two module updates with the following details:
Module – Standard Features Naming Convention (SFNC) version 2.8:

1. New Features and Component Additions
  • Added CoordinateMapA and CoordinateMapB component types.
  • Added A and B coordinate map support for Scan 3D Projection output mode.
  • Added Scan 3D Projection output mode.
  • Added Scan3dCoordinateMapEnable for enhanced 3D scanning workflows.
  • Added JPEG XS support as a new compression/encoding option.
  • Added UserSetReset feature.
2. Units and Standards Improvements
  • Updated electrical units: Volt → V, Amp → A.
  • Added these updated units to the Standard Units table.
  • Added missing ns (nanoseconds) unit to the standards list.
  • Set ns as the unit for all timestamp related features for consistency.
3. Clarifications and Requirements
  • Added notes outlining requirements for Trigger, Exposure, and Gain features.
  • Clarified usage and units for EncoderResolution and DeviceLinkSpeed.
  • Clarified GroupSelector Interface type behavior when very large numbers of groups are present.
  • Made all Device SFNC version features mandatory to ensure consistent versioning.
4. GigE Vision and CoaXPress Updates
  • Added GevStreamingMode and GevControlChannelMaxPacketSize for improved GigE Vision configuration for the upcoming GigE Vision 3.0 specification.
  • Removed explicit CXP link speed reference and added clarifications around test mode behavior.
5. General Corrections
  • Miscellaneous minor corrections, text clarifications, and precision improvements throughout the document.

Module – GenDC version 1.2:

  • Introduced support for JPEG-XS payloads
  • Miscellaneous clarifications have been added to ensure better interoperability

Young Professional Award ’26 | Last Chance to Apply

The deadline to apply for the EMVA Young Professional Award has been extended to April 30, 2026

The annual award is endowed with 1500 Euros to honor the outstanding and innovative work of a student or a young professional in the field of machine vision or image processing.

It is the goal of the European Machine Vision Association EMVA to support further innovation in our industry, to contribute to the important aspect of dedicated machine vision education, and to provide a bridge between research and industry.

 


The winner of the award will be announced at the flagship 24. EMVA Business Conference 2026 taking place June 18-20, 2026 in Stockholm, Sweden, and will have the opportunity to present the awarded work to the machine vision industry leaders from Europe and abroad. The presentation will then be published by the international machine vision press.
In addition to the honor of the EMVA Young Professional Award endowed with 1500 Euros and the publicity for the research work is a free conference pass for the EMVA Business Conference as well as the coverage of all travel cost to Stockholm and a free pass for the 2026 European Machine Vision Forum.